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UID:pretalx-juliacon-2026-FDVTJJ@pretalx.com
DTSTART;TZID=CET:20260814T144500
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DESCRIPTION:A precise material deposition is nowadays a key component of an
 y microchip production. A prominent deposition technique offering the requ
 ired level of control is area-selective atomic layer deposition. To improv
 e this technique the chemical reactions of the adsorbates at the substrate
  surface are modeled. Here\, the presented random sequential adsorption ap
 proach targets to model the adsorption and packing of the first adsorbate 
 layer. Implementation of the key assumptions as well as first results are 
 part of this contribution.
DTSTAMP:20260502T115406Z
LOCATION:Room 4
SUMMARY:RandomSequentialAdsorption.jl - Modeling Adsorbate Packing in Area-
 Selective Atomic Layer Deposition - Fabian Pieck
URL:https://pretalx.com/juliacon-2026/talk/FDVTJJ/
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